Submicron T-shaped gate HEMT fabrication using deep-UV lithography
نویسندگان
چکیده
منابع مشابه
Fabrication of ultra-compact photonic structures in Silicon-on- Insulator (SOI) using 248nm deep UV lithography
Wim Bogaerts, Vincent Wiaux*, Dirk Taillaert, Stephan Beckx*, Roel Baets Ghent University-IMEC, Dept. of Information Technology, Sint-Pietersnieuwstraat 41, 9000 Gent, Belgium * IMEC vzw, Silicon Process Technology Division, Kapeldreef 75, B-3001 Leuven, Belgium Tel: (32) 9 264 3446, Fax: (32) 9264 3593 , e-mail: [email protected] ABSTRACT We demonstrate the use of deep UV lithograph...
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ژورنال
عنوان ژورنال: IEEE Electron Device Letters
سال: 1994
ISSN: 0741-3106,1558-0563
DOI: 10.1109/55.296215